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Now showing items 1 - 4 of 4

  • Tribological Characterization of TiN Coatings prepared by Magnetron Sputtering

    Makwana, Nishant S.   Chauhan, Kamlesh V.   Sonera, Akshay L.   Chauhan, Dharmesh B.   Dave, Divyeshkumar P.   Rawal, Sushant K.  

    Titanium nitride (TiN) coating deposited on aluminium and brass pin substrates using RF reactive magnetron sputtering. The structural properties and surface morphology were characterized by X-ray diffraction (XRD), atomic force microscope (AFM) and field emission scanning electron microscope (FE-SEM). There was formation of (101) Ti2N, (110) TiN2 and (102) TiN0.30 peaks at 3.5Pa, 2Pa and 1.25Pa sputtering pressure respectively. The tribological properties of coating were inspected using pin on disc tribometer equipment. It was observed that TiN coated aluminium and brass pins demonstrated improved wear resistance than uncoated aluminium and brass pins.
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  • Effect of sputtering pressure on molybdenum oxide thin films prepared by Rf magnetron sputtering

    Sonera, Akshay L.   Chauhan, Kamlesh V.   Chauhan, Dharmesh B.   Makwana, Nishant S.   Dave, Divyeshkumar P.   Raval, Sushant K.  

    The aim of this paper is to investigate the effect of sputtering pressure variation on Molybdenum oxide thin films were deposited by RF reactive magnetron sputtering. The effect of sputtering pressure on structural and wettability properties of molybdenum oxide films was studied. The decrease of sputtering pressure from 4.5Pa to 1.5Pa which led to evolution of (540), (001) and (015) textures of molybdenum oxide. The XRD results show increment of preferred orientation along with (001) plane for deposited molybdenum oxide films. The average crystallite size is within range 10.09nm-27.39nm with decrease of sputtering pressure from 4.5Pa to 1.5Pa. The static contact angle formed by water and surface energy varies as a function of sputtering pressure. The surface roughness increases from 16.886 to 30.16 nm with decrease in sputtering pressure from 4.5Pa to 1.5Pa.
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  • Study the Effect of Nitrogen Flow Rate on Tribological Properties of Tantalum Nitride Based Coatings

    Chauhan, Dharmesh B.   Chauhan, Kamlesh V.   Sonera, Akshay L.   Makwana, Nishant S.   Dave, Divyeshkumar P.   Rawal, Sushant K.  

    Tantalum Nitride (TaN) based coatings are well-known for their high temperature stability and chemical inertness. We have studied the effect of nitrogen flow rate variation on the structural and tribological properties of TaN based coating deposited by RF magnetron sputtering process. The nitrogen flow rate was varied from 5 to 30 sccm. X-ray diffractometer (XRD) and Atomic Force Microscopy (AFM) were used to determine structure and surface topography of coating. Pin on disc tribometer was used to determine tribological properties of coating. TaN coated brass and mild steel substrates shows higher wear resistance compared to uncoated substrates of brass and mild steel.
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  • Share the World\"s Resources: An Interview with Rajesh Makwana

    Nelson   C.  

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