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PROCESS CHAMBER AND SEMICONDUCTOR PROCESSING APPARATUS

Abstract(summary):

Provided in the present invention are a process chamber and a semiconductor processing apparatus. The process chamber comprises at least two reaction compartments, at least two sets of mutually independent air intake systems, and a chip transfer apparatus. The at least two reaction compartments are arranged within the process chamber and are distributed evenly in the circumferential direction thereof, and each reaction chamber constitutes therein an independent process environment. The air intake systems deliver in a one-to-one correspondence a process gas to the reaction compartments. The chip transfer apparatus is used for transferring chips into the reaction compartments. The process chamber and the semiconductor processing apparatus provided in the present invention allow for two or more processes to be carried out simultaneously in a single process chamber, thus not only is the process chamber structurally compact and small in footprint, but also obviated is the need to redesign the structure of a transfer chamber, thus allowing for reduced costs for manufacturing the apparatus.


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