REFLECTION-TYPE LIGHT-SPLITTING GRATING AND INTERFERENCE PHOTOETCHING SYSTEM

Abstract(summary):

A reflection-type light-splitting grating and an interference photoetching system. The reflection-type light-splitting grating (1) comprises a grating groove-shaped region (11) located on a reflection plane (10) and a light blocking region (12) located on the periphery of the grating groove-shaped region (11), wherein the grating groove-shape region (11) comprises a grating structure (110) periodically distributed. The grating structure (110) is provided with a groove-shaped reflection plane (111) and a non-reflection region (112), and an oblique angle is formed between the groove-shaped reflection plane (111) and a grating basal plane. The reflection-type light-splitting grating (1) can realize the maximum modulation on light of ± 1 level, so that the beam splitting light reflected out has the highest energy utilization rate. An interference pattern obtained via the reflection-type light-splitting grating (1) has good boundary quality, so that precise pattern splicing can be conducted, thereby promoting the large-breadth interference photoetching technique.