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TRANSMISSION-TYPE LIGHT-SPLITTING GRATING AND INTERFERENCE PHOTOETCHING SYSTEM

Abstract(summary):

A transmission-type light-splitting grating and an interference photoetching system. The transmission-type light-splitting grating (1) comprises a grating groove-shaped region (11) located on an incident plane (10) and a light blocking region (12) located on the periphery of the grating groove-shaped region (11), wherein the grating groove-shaped region (11) comprises a stepped grating structure (110), and the stepped grating structure (110) is provided with a transmission step plane (111) and a non-transmission region (112). The transmission-type light-splitting grating (1) can realize the maximum modulation on light of ± 1 level, so that the beam splitting light transmitted out has the highest energy utilization rate. An interference pattern obtained via the transmission-type light-splitting grating (1) has good boundary quality, so that precise pattern splicing can be completed, thereby significantly promoting the large-breadth interference photoetching technique.


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