PHOTOMASK, METHOD FOR MANUFACTURING THE SAME, PROJECTION ALIGNER USING THE PHOTOMASK, AND PROJECTION EXPOSING METHOD

Abstract(summary):

A photomask which exhibits sufficient durability even against an exposing beam of short wavelength and preventing adhesion of particles to a pattern to be transferred. The photomask is provided with a pattern to be transferred to a substrate (19) to be exposed and directs a specific exposing beam for irradiating the pattern surface (1P) where the transfer pattern is formed to a projection optical system (PL) for forming the image of the pattern. A transmitting substrate (3) having a specified thickness (h) and transmitting the exposing beam is disposed at a specified interval (d0) from the pattern surface. The transmitting substrate is generally square and satisfies specified conditions.