Creat membership Creat membership
Sign in

Forgot password?

Confirm
  • Forgot password?
    Sign Up
  • Confirm
    Sign In
Creat membership Creat membership
Sign in

Forgot password?

Confirm
  • Forgot password?
    Sign Up
  • Confirm
    Sign In
Collection
For ¥0.57 per day, unlimited downloads CREATE MEMBERSHIP Download

toTop

If you have any feedback, Please follow the official account to submit feedback.

Turn on your phone and scan

home > search >

Room temperature atomic layer deposition of TiO2 on gold nanoparticles

Author:
Kikuchi, Ko  Miura, Masanori  Kanomata, Kensaku  Ahmmad, Bashir  Kubota, Shigeru  Hirose, Fumihiko  


Journal:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A


Issue Date:
2017


Abstract(summary):

The authors developed a room temperature atomic layer deposition (ALD) system that can deposit TiO2 on gold nanoparticles by using tetrakis(dimethylamino) titanium and plasma-excited humidified argon. The growth per cycle of TiO2 was measured to be 0.25 nm/cycle on a monitored Si sample. For applying the nanoparticle coating, the source material, i. e., gold particles, is electrostatically attached to the susceptor in the ALD system to avoid their gas transport. These particles are then mixed by a rotating scraper during the ALD process. This system allows a conformal deposition of TiO2 without the aggregation of nanoparticles. The thickness of TiO2 for shell coating is controlled by counting the number of ALD cycles. The deposition of TiO2 coating with a nanometer scale thickness on the gold nanoparticle is demonstrated in this paper. (C) 2016 American Vacuum Society.


VIEW PDF

The preview is over

If you wish to continue, please create your membership or download this.

Create Membership

Similar Literature

Submit Feedback

This function is a member function, members do not limit the number of downloads