Abnormal hardness behavior of Cu-Ta films prepared by magnetron sputtering

Author:

Qin, Wen  Fu, Licai  Xie, Tianle  Zhu, Jiajun  Yang, Wulin  Li, Deyi  Zhou, Lingping  

Journal:

JOURNAL OF ALLOYS AND COMPOUNDS

Issue Date:

2017

Abstract(summary):

The microstructure, nanoindentation hardness of the sputtering deposited Cu-Ta films were investigated. Because of high hardness of Ta, the hardness of Cu-Ta films increases with Ta content, except for a platform in the range of 20 at.% similar to 60 at.% Ta that being related to the amorphous structure. This abnormal behavior presents that the hardness of Cu-Ta films is independent of alloy elemental content in the amorphous structure. The Ta addition inducing to Cu-Ta hardening is counteracted by the increase of inter-atomic distance in the amorphous structure with increasing of Ta. So this opposite effect makes the hardness platform. (C) 2017 Elsevier B. V. All rights reserved.

Page:

1033---1037