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Thermal decomposition of non-catalysed MgH<sub>2</sub> films

Author:
M. Barawi  C. Granero  P. Díaz-Chao  C.V. Manzano  M. Martin-Gonzalez  D. Jimenez-Rey  I.J. Ferrer  J.R. Ares  J.F. Fernández  C. Sánchez  


Journal:
International Journal of Hydrogen Energy


Issue Date:
2014


Abstract(summary):

Abstract Nanocrystalline Mg films with thicknesses between 45 and 900 nm were prepared by e-beam on fused-SiO 2 substrates and hydrogenated at 280 °C to investigate the H-absorption/desorption process. Films were characterized by XRD, RBS, Raman, FEG, “in situ” optical measurements and TPD-MS. Whereas practically full conversion into MgH 2 is observed in thinner films ( d  < 150–200 nm), higher amount of hydrogen is not absorbed by thicker films ( d  > 200–250 nm) that is attributed to the formation of Mg 2 Si–MgO phases (observed by RBS and Raman) as well as the slow kinetics of MgH 2 formation. H-desorption process is controlled by a nucleation and growth process and hydrogen is released at lower desorption temperatures ( T d  = 425 °C) than bulk MgH 2 . T d are slightly lower (Δ T  ∼ 25 °C) in thickest hydrogenated films ( d  > 200–250 nm) suggesting an influence of Mg 2 Si and MgO phases, formed during hydrogenation. Highlights • H-absorption is uncompleted in Mg film with thickness >200 nm. • Raman and RBS measurements show the formation of Mg 2 Si and MgO due to substrate reaction. • Mg 2 Si/MgO phase formation will preclude the complete hydrogenation of films. • No influence of thickness on H-desorption mechanism is observed.


Page:
9865-9865


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