Creat membership Creat membership
Sign in

Forgot password?

Confirm
  • Forgot password?
    Sign Up
  • Confirm
    Sign In
Creat membership Creat membership
Sign in

Forgot password?

Confirm
  • Forgot password?
    Sign Up
  • Confirm
    Sign In
Collection
For ¥0.57 per day, unlimited downloads CREATE MEMBERSHIP Download

toTop

If you have any feedback, Please follow the official account to submit feedback.

Turn on your phone and scan

home > search >

Reduction of Defects in GaN on Reactive Ion Beam Treated Sapphire by Annealing

Author:
D. Byun   J. Jhin   S. Cho   J. Kim   S.J. Lee   C.H. Hong   G. Kim   W.-K. Choi  


Issue Date:
2001


Abstract(summary):

Abstract

Previous studies showed that reactive ion beam (RIB) pretreatment of sapphire prior to GaN deposition results in the reduction of dislocation density in the GaN film. It was also found that an amorphous phase remained at the interface region after the GaN deposition at high temperature. Annealing was performed to obtain the structural change due to the recrystallization of the remaining amorphous phase, and the effect on the electrical properties of the GaN thin film on RIB treated sapphire (0001) substrate. DCXRD spectra and Hall mobility of the specimen were studied as a function of the annealing time at 1000 °C in N2 atmosphere. For the annealed specimen, FWHM of DCXRD decreased and the mobility increased. The annealed specimen was compared with a not annealed sample by TEM. A decrease of lattice strain and a reduction of the dislocation density about 56–59% was observed. The present results clearly show that the combination of RIB pretreatment and proper post annealing conditions improve the properties of GaN films grown by MOCVD.



Page:
315-318


VIEW PDF

The preview is over

If you wish to continue, please create your membership or download this.

Create Membership

Similar Literature

Submit Feedback

This function is a member function, members do not limit the number of downloads