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Model of morphology evolution in the growth of polycrystalline β-SiC films

Author:
Yun, Jungheum   Dandy, David S.  


Journal:
Diamond and Related Materials


Issue Date:
2000


Abstract(summary):

The growth of β-SiC films via chemical vapor deposition (CVD) has been under intensive investigation because this is viewed to be an enabling material for a variety of new semiconductor devices in areas where silicon cannot effectively compete. However, the difficulty in achieving single-crystal or highly textured surface morphology in films with low bulk defect density has limited the use of β-SiC films in electronic devices. Although several researchers have reported results relating the morphology of β-SiC films to deposition parameters, including substrate temperature and gas composition, detailed knowledge of the effects of deposition parameters on film morphology and crystallographic texture is still lacking. If these relationships between deposition parameters and film morphology can be quantified, then it may be possible to obtain optimal β-SiC film morphologies via CVD for specific applications such as high-power electronic devices.


Page:
439-445


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