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Fabrication of gold nanoparticle lines based on fracture induced patterning

Author:
Jun Tang   S. Kolliopoulou   D. Tsoukalas  


Journal:
Microelectronic Engineering


Issue Date:
2009


Abstract(summary):

We present a low cost method for the selective deposition of gold nanoparticles from a gold colloid. We first introduce a process of maskless patterning on a photoresist layer. With this process, we have fabricated photoresist gratings with a period from 1 to 30 μm, using the fracture induced patterning technique. Then we have performed gold nanoparticle deposition on this patterned surface by a surface functionalization technique. For that purpose, silicon dioxide (SiO2) was deposited on the sample followed by a lift-off process. The remained SiO2 lines after the lift-off were functionalized with 2,3-aminopropyltrimethoxysilane (APTMS) for the selective deposition of the gold colloid. After the deposition, the gold nanoparticles are well organized on top of the SiO2 line patterns.


Page:
861-864


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