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A new method for measuring a small displacement by using the critical angle method and confocal technology

Author:
Liao, SJ  Wang, SF  Chiu, MH  


Journal:
Nanophotonics, Nanostructure, and Nanometrology


Issue Date:
2005


Abstract(summary):

A new method for measuring a very small displacement is presented. The principles of the measurement are based on the critical angle method and confocal technology It will increase the lateral and longitudinal resolutions higher than 0.3 mu m and 5nm, respectively, and the maximum displacement could be above 12 mu m. This optical structure could be applied to measure some messages for optical surface, bio-medical science, and nanotechnology in the future. The new technique has some merits, such as a simple and compact optical setup, high sensitivity, and high resolution. Keyword: confocal microscope, critical angle method


Page:
211---218


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