PROPERTIES OF Ta(2)O(5) THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

Author:

Zhou Jicheng  Luo Ditian  Li Youzhen  Liu Zheng  

Journal:

INTERNATIONAL JOURNAL OF MODERN PHYSICS B

Issue Date:

2009

Abstract(summary):

Ta(2)O(5) thin films were deposited at different oxygen flow ratio (O(2)/(O(2) + Ar) = 10% similar to 80%) by DC reactive magnetron sputtering. Influence of oxygen flow ratio on depositing rate, surface characteristics, microstructure, and optical properties are discussed in this paper. With the increasing of oxygen, deposition rate decreases exponentially, the root mean square roughness and the maximum roughness decrease according to the atom force microscope images. XRD patterns indicate the as-deposited Ta(2)O(5) films are amorphous. Based on the envelop method, the samples' optical constants are calculated from the curve of transmission spectrum. The results indicate that refractive index n increases from 2.01 to 2.20 (lambda - 500 nm) for the oxygen flow ratio increases from 20% to 60%, the extinction coefficient k appears to decrease.

Page:

5275---5282