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Electroless Deposition of Silver Layer on Atomic-Layer-Deposited TiN

Author:
Lee, Yuan Gee  


Journal:
DIGITAL MANUFACTURING & AUTOMATION III, PTS 1 AND 2


Issue Date:
2012


Abstract(summary):

A laminate of silver/atomic layer deposition TiN/Si was prepared to research the thermal reliability. The atomic layer TiN was subjected into different kinds of plasma to modify its surface chemistry. The surface tension of the TiN/Si surface was found to be reduced by 02 plasma bombardment. The reaction mechanism of the continuum of silver film was also explored in this paper.


Page:
471---473


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