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Hetero- and homo-epitaxial growth of 3C-SiC for MOS-FETs

Author:
Nagasawa, H  Yagi, K  Kawahara, T  Hatta, N  Abe, M  


Journal:
MICROELECTRONIC ENGINEERING


Issue Date:
2006


Abstract(summary):

Planar defects, like anti-phase boundaries (APBs) and stacking faults (SFs), are reduced by growing 3C-SiC oil undulant-Si whose entire surface is covered with countered slopes oriented in the [110] and (110] directions. During the initial 3C-SiC growth, APBs are eliminated oil each slope of an undulation. Then, one kind of SF self-vanishes. However, another kind of SF remains oil the 3C-SiC surface, although its density is gradually reduced with increasing SiC thickness by combining with a counter-SF. The leakage current of a pn diode fabricated homo-epitaxially oil 3C-SiC is roughly proportional to the SF density before homo-epitaxial growth. The viability of 3C-SiC grown oil undulant-Si for semiconductor devices is discussed by reviewing recent reports oil various MOS-FETs using it as the substrate. The key issue in the fabrication of a MOS-FET as a power-switching device operated Lit high-voltage is to reduce the leakage-current at the pn junction, thereby eliminating SFs. (c) 2005 Elsevier B.V. All rights reserved.


Page:
185---188


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