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Structure and mechanical properties of Ti-Al films deposited by magnetron sputtering

Author:
Oliveira, JC  Manaia, A  Dias, JP  Cavaleiro, A  Teer, D  Taylor, S  


Journal:
SURFACE & COATINGS TECHNOLOGY


Issue Date:
2005


Abstract(summary):

Thin films of Ti-Al were deposited by d.c. magnetron sputtering on M2 (AISI) steel substrates. A composition scan of the Ti-Al system was carried out using pure Ti and Al targets placed at 90 degrees. X-ray diffraction showed that for the high At content films (71.5-86.1 at.% of Al) only the face centred cubic (f.c.c.) At phase was deposited with a (111) preferential orientation. Within this range of compositions, both the width of the (111) planes diffraction peaks and the hardness of the films increased (from 8.9-13 GPa) with increasing Ti content, The Ti-Al films deposited with aluminium contents in the range from 32.5 to 57.1 Al at.% showed low hardness (8.8-10.3 GPa) and only a broad diffraction peak centred at 2 theta approximate to 45.4 degrees was detected. For the high titanium content films (3.7-19.9 at.% of Al) the hexagonal close packed (h.c.p.) Ti phase peaks were detected by X-ray diffraction, superimposed on a broad diffraction peak centred at 2 theta approximate to 44.8 degrees. These films showed the highest hardness values (up to 23 GPa). The composition range from 19.9 to 32.5 at.% of Al was selected for further work since it includes the films that presented the best combination between hardness and friction coefficient. (c) 2005 Elsevier B.V. All rights reserved.


Page:
395---398


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