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WAFER WASHING METHOD, AND LIQUID CHEMICAL USED IN SAME

Abstract(summary):

[Problem] To provide a liquid chemical used for forming a water repellent protective membrane, said liquid chemical being used in a wafer washing method in which a washing device that includes a vinyl chloride resin as a wetted member is used. [Solution] A liquid chemical is used, said liquid chemical including at least one compound selected from the group consisting of: an alkoxysilane represented by general formula [1]; a sulfonic acid represented by general formula [2]; an anhydrate of said sulfonic acid; a salt of said sulfonic acid; and a sulfonic acid derivative represented by general formula [3]. Also included in the liquid chemical is a dilution solvent having at least one compound selected from the group consisting of a hydrocarbon, ether, and thiol. [1] (R1) aSi (H)b (OR2)4-a-b [2] R3 – S(=O)2OH [3] R3 – S (=O)2 O-Si (H)3-c (R4)c


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