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Large area manufacturing of plasmonic colour filters using substrate conformal imprint lithography

Author:
Rumler, M.  Foerthner, M.  Baier, L.  Evanschitzky, P.  Becker, M.  Rommel, M.  Frey, L.  


Journal:
NANO FUTURES


Issue Date:
2017


Abstract(summary):

This work presents the large area fabrication of plasmonic colour filters consisting of subwavelength apertures in aluminium films of different thicknesses. Wafer-scale pattern transfer was realized by a soft lithography technique (substrate conformal imprint lithography). The fabricated colour filters have an active area of up to 145 cm(2) which presents a considerable increase compared to previously published results. In addition to experimental investigations, simulations of the transmission behaviour were performed using a rigorous electromagnetic field solver based on an extended RCWA approach. Furthermore, the use of a spin-coated cover layer consisting of the UV-curable hybrid polymer OrmoComp (R) instead of often applied PECVD-SiO2 was investigated.


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