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Bottom-up fabrication of InAs-on-nothing MOSFET using selective area molecular beam epitaxy

Author:
Pastorek, Matej  Olivier, Aurelien  Lechaux, Yoann  Wichmann, Nicolas  Karatsori, Theano  Fahed, Maria  Bucamp, Alexandre  Addad, Ahmed  Troadec, David  Ghibaudo, Gerard  Desplanque, Ludovic  Wallart, Xavier  Bollaert, Sylvain  


Journal:
NANOTECHNOLOGY


Issue Date:
2019


Abstract(summary):

In this paper we report on the fabrication and electrical characterization of InAs-on-nothing metal-oxide-semiconductor field-effect transistor composed of a suspended InAs channel and raised InAs n+ contacts. This architecture is obtained using 3D selective and localized molecular beam epitaxy on a lattice mismatched InP substrate. The suspended InAs channel and InAs n+ contacts feature a reproducible and uniform shape with well-defined 3D sidewalls. Devices with 1 mu m gate length present a saturation drain current (I-Dsat) of 300 mA mm(-1) at V-DS =3D 0.8 V and a trans-conductance (G(M)) of 120 mS mm(-1) at V-DS =3D 0.5 V. In terms of electrostatic control, the devices display a minimal subthreshold swing of 110 mV dec(-1) at V-DS =3D 0.5 V and a small drain induced barrier lowering of 50 mV V-1.


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