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Deposition of high Tc Nb-(Ge,Si) films at substrate temperature below 400°C by magnetron sputtering

Author:
Terada, N.   Hoshi, Y.   Naoe, M.   Yamanaka, S.  


Issue Date:
1982


Abstract(summary):

http://ieeexplore.ieee.org/lpdocs/epic03/wrapper.htm?arnumber=1061965


Page:
1580-1582


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