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Ion beam sputter-deposition of LiCoO2 films

Author:
Tobias Stockhoff   Tobias Gallasch   Frank Berkemeier   Guido Schmitz  


Journal:
Thin Solid Films


Issue Date:
2012


Abstract(summary):

LiCoO 2 films, 200nm in thickness, are produced by ion beam sputter-deposition. The structural, electrical and electrochemical properties of the films are studied by means of X-ray diffraction (XRD), electrical direct-current-measurements, and electron energy loss spectroscopy (EELS). The influence of preparation parameters like substrate temperature or oxygen partial pressure, are explored. While an oxygen deficiency was observed in films sputtered under pure argon atmosphere, the oxygen content of the thin films increases, significantly, in case of films sputtered under addition of O 2. At substrate temperatures below 300degC, XRD measurements reveal a lattice structure similar to the low-temperature-phase, while the formation of the high-temperature-phase is clearly observed at temperatures above 500degC and an Argon/Oxygen ratio of 3/2. Furthermore, the EELS technique is demonstrated to be a sensitive tool to characterize the lithiation state of the sputter-deposited thin films. [All rights reserved Elsevier].


Page:
3668-3674


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