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Magnetron sputtering deposition Ti-B-C-N films by Ti/B(4)C compound target

Author:
Tang, Guangze  Ma, Xinxin  Sun, Mingren  Xu, Shuyan  


Journal:
SURFACE & COATINGS TECHNOLOGY


Issue Date:
2009


Abstract(summary):

Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B(4)C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N(2) to Ar and the magnetron coil current. The main crystal phase in the films was TiB(2). The proportion of crystalline TiB(2) decreased with the increasing of N(2) partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more Ti(B)2 proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness. (C) 2008 Elsevier B.V. All rights reserved.


Page:
1288---1291


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